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Dynamic Maskless Holographic Lithography and Applications

McAdams, Daniel (2013) Dynamic Maskless Holographic Lithography and Applications. Doctoral Dissertation, University of Pittsburgh. (Unpublished)

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The purpose of this research is to improve the resolution of dynamic
maskless holographic lithography (DMHL) by using two-photon
absorption, to provide a more thorough characterization of the
process, and to expand the functionality of the process by adding
previously undemonstrated patterning modes. Two-photon DMHL will be
performed in both 2D and 3D configurations with specific
characterization relating to process resolution and repeatability.
The physical limits of DMHL will be discussed and ways to circumvent
them will be proposed and tested.

DMHL eliminates the need for a separate mask for every different
pattern exposure and allows for real-time shaping of the exposure
pattern. It uses an electrically addressable spatial light modulator
(SLM) to create an arbitrary intensity pattern at the specimen
plane. The SLM is a phase mask that displays a hologram. An
algorithm is used to find an appropriate phase hologram for each
desired intensity pattern. Each pixel of the SLM shapes the
wavefront of the incoming laser light so that the natural Fourier
transforming property of a lens causes the desired image to appear
in the specimen plane. The process enables one-off projects to be
done without the cost of fabricating a mask, and makes it possible
to perform lithography with fewer (or even no) moving parts.


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Item Type: University of Pittsburgh ETD
Status: Unpublished
CreatorsEmailPitt UsernameORCID
McAdams, Danieldrm33@pitt.eduDRM33
ETD Committee:
TitleMemberEmail AddressPitt UsernameORCID
Committee ChairCole, Daniel G.dgcole@pitt.eduDGCOLE
Committee MemberCho, Sung Kwonskcho@pitt.eduSKCHO
Committee MemberClark, William W.wclark@pitt.eduWCLARK
Chen, Kevin P.pec9@pitt.eduPEC9
Date: 1 February 2013
Date Type: Publication
Defense Date: 21 August 2012
Approval Date: 1 February 2013
Submission Date: 30 August 2012
Access Restriction: No restriction; Release the ETD for access worldwide immediately.
Number of Pages: 226
Institution: University of Pittsburgh
Schools and Programs: Swanson School of Engineering > Mechanical Engineering
Degree: PhD - Doctor of Philosophy
Thesis Type: Doctoral Dissertation
Refereed: Yes
Uncontrolled Keywords: Holographic Lithography, Maskless Lithography, Micro-manufacturing
Date Deposited: 01 Feb 2013 13:12
Last Modified: 15 Nov 2016 14:03


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