Tritiation of amorphous and crystalline silicon using T <inf>2</inf> gas

Liu, B and Chen, KP and Kherani, NP and Kosteski, T and Costea, S and Zukotynski, S and Antoniazzi, AB (2006) Tritiation of amorphous and crystalline silicon using T <inf>2</inf> gas. Applied Physics Letters, 89 (4). ISSN 0003-6951

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Abstract

Incorporation of tritium in hydrogenated amorphous silicon (a-Si:H) and crystalline silicon (c-Si) at 250 °C using tritium (T 2) gas at pressures of up to 120 atm is reported. The tritium is stored in a surface layer which is approximately 150 and 10 nm for a-Si:H and c-Si, respectively. The concentration of tritium occluded in planar and textured c-Si is linearly dependent on the total surface area. The tritium is stable and the dominant tritium evolution occurs at temperatures above 300 °C. The concentration of tritium locked in a-Si:H and c-Si was 20 and 4 at. %, respectively. Self-catalysis appears to be important in the tritiation process. © 2006 American Institute of Physics.

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Details

Item Type:	Article
Status:	Published
Creators/Authors:	Creators Email Pitt Username ORCID Liu, B Chen, KP pec9@pitt.edu PEC9 0000-0002-4830-0817 Kherani, NP Kosteski, T Costea, S Zukotynski, S Antoniazzi, AB
Date:	4 August 2006
Date Type:	Publication
Journal or Publication Title:	Applied Physics Letters
Volume:	89
Number:	4
DOI or Unique Handle:	10.1063/1.2234844
Schools and Programs:	Swanson School of Engineering > Electrical and Computer Engineering
Refereed:	Yes
ISSN:	0003-6951
Date Deposited:	01 Jul 2014 17:36
Last Modified:	22 Jun 2021 13:55
URI:	http://d-scholarship.pitt.edu/id/eprint/22147

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