Ohlinger, K and Zhang, H and Lin, Y and Xu, D and Chen, KP
(2011)
A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: bandgap simulation and holographic fabrication.
Optical Materials Express, 1 (5).
1 - 6.
Abstract
Through the use of a multi-layer phase mask to produce five-beam interference, three-dimensional photonic crystals can be formed through single exposure to a photoresist. In these holographically formed structures, the interconnectivity is controlled by the relative phase difference among contributing beams. Photonic band gaps are calculated and the simulation shows a maximum bandgap of 18% of the middle gap frequency when the phase difference is optimized. A three-layer phase mask is fabricated by placing a spacer layer between two orthogonally-orientated gratings. The phase difference is controlled by thermal-tuning of the spacer thickness. Photonic crystal templates are holographically fabricated in a photosensitive polymer using the phase mask.
Share
| Citation/Export: |
|
| Social Networking: |
|
Details
Metrics
Monthly Views for the past 3 years
Plum Analytics
Altmetric.com
Actions (login required)
 |
View Item |
![[img]](http://d-scholarship.pitt.edu/style/images/fileicons/text_plain.png)
![[feed]](/images/feed-icon-32x32.png){kind=icon}