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A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: bandgap simulation and holographic fabrication

Ohlinger, K and Zhang, H and Lin, Y and Xu, D and Chen, KP (2011) A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: bandgap simulation and holographic fabrication. Optical Materials Express, 1 (5). 1 - 6.

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Abstract

© 2011 Optical Society of America. All Rights Reserved. Through the use of a multi-layer phase mask to produce five-beam interference, three-dimensional photonic crystals can be formed through single exposure to a photoresist. In these holographically formed structures, the interconnectivity is controlled by the relative phase difference among contributing beams. Photonic band gaps are calculated and the simulation shows a maximum bandgap of 18% of the middle gap frequency when the phase difference is optimized. A three-layer phase mask is fabricated by placing a spacer layer between two orthogonally-orientated gratings. The phase difference is controlled by thermal-tuning of the spacer thickness. Photonic crystal templates are holographically fabricated in a photosensitive polymer using the phase mask.


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Details

Item Type: Article
Status: Published
Creators/Authors:
CreatorsEmailPitt UsernameORCID
Ohlinger, K
Zhang, H
Lin, Y
Xu, D
Chen, KPpec9@pitt.eduPEC90000-0002-4830-0817
Date: 1 September 2011
Date Type: Publication
Journal or Publication Title: Optical Materials Express
Volume: 1
Number: 5
Page Range: 1 - 6
DOI or Unique Handle: 10.1364/ome.1.001034
Schools and Programs: Swanson School of Engineering > Electrical and Computer Engineering
Refereed: Yes
Date Deposited: 16 Oct 2014 18:47
Last Modified: 16 Jan 2021 19:55
URI: http://d-scholarship.pitt.edu/id/eprint/23269

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