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Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure

Xu, D and Chen, KP and Ohlinger, K and Lin, Y (2011) Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure. Nanotechnology, 22 (3). ISSN 0957-4484

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Abstract

We report a combined holographic and nanoimprinting lithography technique to produce three-dimensional woodpile photonic crystal templates through only one single exposure. The interference lithography process uses an integratable diffractive optical element for large throughout 3D pattern manufacturing. The diffractive optical element consists of two layers of phase grating separated by an intermediate layer, fabricated by repeated nanoimprinting lithography, followed by an SU8 photoresist bonding technique. Grating periods, relative orientation, diffraction angle, and efficiency, as well as layer to layer phase delay, are well designed during manufacturing. By thermally optimizing the thickness of the intermediate layer, this paper demonstrates the fabrication of interconnected 3D photonic structures with arbitrary symmetry through a single laser exposure. The two-layer phase mask approach enables a CMOS-compatible monolithic integration of 3D photonic structures with other integrated optical elements and waveguides. © 2011 IOP Publishing Ltd.


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Details

Item Type: Article
Status: Published
Creators/Authors:
CreatorsEmailPitt UsernameORCID
Xu, D
Chen, KPpec9@pitt.eduPEC90000-0002-4830-0817
Ohlinger, K
Lin, Y
Date: 21 January 2011
Date Type: Publication
Journal or Publication Title: Nanotechnology
Volume: 22
Number: 3
DOI or Unique Handle: 10.1088/0957-4484/22/3/035303
Schools and Programs: Swanson School of Engineering > Electrical and Computer Engineering
Refereed: Yes
ISSN: 0957-4484
Date Deposited: 17 Oct 2014 15:44
Last Modified: 15 Jan 2021 15:55
URI: http://d-scholarship.pitt.edu/id/eprint/23279

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