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Photonic crystals with defect structures fabricated through a combination of holographic lithography and two-photon lithography

Ohlinger, K and Torres, F and Lin, Y and Lozano, K and Xu, D and Chen, KP (2010) Photonic crystals with defect structures fabricated through a combination of holographic lithography and two-photon lithography. Journal of Applied Physics, 108 (7). ISSN 0021-8979

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Abstract

This paper presents the capability of direct laser writing of complex defect structures in holographically formed three-dimensional photonic crystals in dipentaerythritol penta/hexaacrylate (DPHPA) monomers mixed with photoinitiators. The three-dimensional photonic crystal template was fabricated through prism-based holographic lithography. Defect structures are fabricated through the two-photon polymerization excited by a femtosecond laser. The strengths of two optical lithographic techniques are combined with holographic lithography providing a rapid and large area microfabrication and two-photon lithography providing flexibility in fabrication of defect structures. The optical fabrication process is simplified in the negative tone DPHPA without prebake and postexposure bake as is required of SU-8 while maintaining a capability for constructing photonic structures with small features. © 2010 American Institute of Physics.

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Details

Item Type: Article
Status: Published
Creators/Authors:
CreatorsEmailPitt UsernameORCID
Ohlinger, K
Torres, F
Lin, Y
Lozano, K
Xu, D
Chen, KPpec9@pitt.eduPEC90000-0002-4830-0817
Date: 1 October 2010
Date Type: Publication
Journal or Publication Title: Journal of Applied Physics
Volume: 108
Number: 7
DOI or Unique Handle: 10.1063/1.3493119
Schools and Programs: Swanson School of Engineering > Electrical and Computer Engineering
Refereed: Yes
ISSN: 0021-8979
Date Deposited: 23 Oct 2014 20:13
Last Modified: 15 Jan 2021 15:55
URI: http://d-scholarship.pitt.edu/id/eprint/23330

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