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Evidence for ion irradiation induced dissociation and reconstruction of Si-H bonds in hydrogen-implanted silicon

Di, ZF and Wang, YQ and Nastasi, M and Shao, L and Lee, JK and Theodore, ND (2008) Evidence for ion irradiation induced dissociation and reconstruction of Si-H bonds in hydrogen-implanted silicon. Applied Physics Letters, 93 (10). ISSN 0003-6951

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Abstract

We observe that H-related chemical bonds formed in H-implanted Si will evolve under subsequent ion irradiation. During ion irradiation hydrogen is inclined to dissociate from simple H-related defect complexes (i.e., VHx and IHx), diffuse, and attach to vacancy-type defects resulting in new platelet formation, which facilitate surface blistering after annealing, a process completely inhibited in the absence of ion irradiation. The understanding of our results provides insight into the structure and stability of hydrogen-related defects in silicon. © 2008 American Institute of Physics.


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Details

Item Type: Article
Status: Published
Creators/Authors:
CreatorsEmailPitt UsernameORCID
Di, ZF
Wang, YQ
Nastasi, M
Shao, L
Lee, JKjul37@pitt.eduJUL370000-0002-7778-7679
Theodore, ND
Centers: Other Centers, Institutes, or Units > Petersen Institute of NanoScience and Engineering
Date: 19 September 2008
Date Type: Publication
Journal or Publication Title: Applied Physics Letters
Volume: 93
Number: 10
DOI or Unique Handle: 10.1063/1.2979686
Schools and Programs: Swanson School of Engineering > Mechanical Engineering and Materials Science
Refereed: Yes
ISSN: 0003-6951
Date Deposited: 30 Oct 2014 16:30
Last Modified: 02 Feb 2019 21:55
URI: http://d-scholarship.pitt.edu/id/eprint/23432

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