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Physical origin of residual thermal stresses in a multilayer ceramic capacitor

Shin, H and Park, JS and Hong, KS and Jung, HS and Lee, JK and Rhee, KY (2007) Physical origin of residual thermal stresses in a multilayer ceramic capacitor. Journal of Applied Physics, 101 (6). ISSN 0021-8979

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Abstract

The physical origin of the residual stresses developed in the ceramic layer of the active region in a multilayer ceramic capacitor was numerically investigated. The compressive in-plane stress components σ11 and σ22 originate without regard to the presence of the margins but rather from the difference in in-plane thermal shrinkage between ceramic and metal electrode. The out-of-plane stress component σ33 physically originates mainly through the presence of the housing margin; the presence of the lateral margin is a minor source: the more ceramic-rich margins hinder the apparent vertical shrinkage of the active region to yield tensile σ33. © 2007 American Institute of Physics.


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Details

Item Type: Article
Status: Published
Creators/Authors:
CreatorsEmailPitt UsernameORCID
Shin, H
Park, JS
Hong, KS
Jung, HS
Lee, JKjul37@pitt.eduJUL370000-0002-7778-7679
Rhee, KY
Centers: Other Centers, Institutes, or Units > Petersen Institute of NanoScience and Engineering
Date: 8 April 2007
Date Type: Publication
Journal or Publication Title: Journal of Applied Physics
Volume: 101
Number: 6
DOI or Unique Handle: 10.1063/1.2713364
Schools and Programs: Swanson School of Engineering > Mechanical Engineering and Materials Science
Refereed: Yes
ISSN: 0021-8979
Date Deposited: 05 Nov 2014 20:47
Last Modified: 19 Feb 2019 19:55
URI: http://d-scholarship.pitt.edu/id/eprint/23452

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