Park, JS and Shin, H and Hong, KS and Jung, HS and Lee, JK and Rhee, KY
(2006)
Effect of margin widths on the residual stress in a multi-layer ceramic capacitor.
Microelectronic Engineering, 83 (11-12).
2558 - 2563.
ISSN 0167-9317
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Abstract
The influence of margin widths on the evolution of residual stress components in a multilayer ceramic capacitor has been investigated numerically by systematically varying the widths of the housing and lateral margins. As for the in-plane residual stress components (compressive), σ11 is much relieved by the housing margin which exists along the length (axis 1) direction, while σ22 is much relieved by the lateral margin which exists along the width (axis 2) direction. The out-of-plane stress component σ33 (tensile) increases via both the housing and lateral margins within the range of the critical width (about 150 μm), beyond which σ33 is not markedly influenced by the widths of margins. © 2006 Elsevier B.V. All rights reserved.
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