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Holographic fabrication of photonic crystals using multidimensional phase masks

Lin, Y and Harb, A and Rodriguez, D and Lozano, K and Xu, D and Chen, KP (2008) Holographic fabrication of photonic crystals using multidimensional phase masks. Journal of Applied Physics, 104 (11). ISSN 0021-8979

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Abstract

This paper reports the experimental approaches to the fabrication of two-layer integrated phase masks and the fabrication of photonic crystal templates using the phase mask based on holographic lithography technique. The photonic crystal template is formed by exposing photoresist mixtures to five-beam interference patterns generated through the phase mask. The fabricated phase mask consists of two layers of orthogonally oriented gratings produced in a liquid crystal and photoresist mixture. A polymerization-induced phase separation preserves the grating structure during the exposure. The vertical spatial separation between two layers of gratings produces a phase difference among diffracted laser beams, which enables the holographic fabrication of diamondlike photonic crystal structures. The fabricated photonic crystal structure is consistent with simulations based on the five-beam interference. The two-layer phase mask opens up an opportunity of direct printing photonic structures. © 2008 American Institute of Physics.


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Details

Item Type: Article
Status: Published
Creators/Authors:
CreatorsEmailPitt UsernameORCID
Lin, Y
Harb, A
Rodriguez, D
Lozano, K
Xu, D
Chen, KPpec9@pitt.eduPEC90000-0002-4830-0817
Date: 1 December 2008
Date Type: Publication
Journal or Publication Title: Journal of Applied Physics
Volume: 104
Number: 11
DOI or Unique Handle: 10.1063/1.3037234
Schools and Programs: Swanson School of Engineering > Electrical and Computer Engineering
Refereed: Yes
ISSN: 0021-8979
Date Deposited: 15 May 2014 20:00
Last Modified: 15 Jan 2021 15:55
URI: http://d-scholarship.pitt.edu/id/eprint/21626

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